Effect of acceptor doping on phase transitions of HfO2 thin films for energy-related applications

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • Min Hyuk Park - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Schenk - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • M. Hoffmann - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • S. Knebel - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Jan Gärtner - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • U. Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)

Details

Original languageEnglish
Pages (from-to)381-389
Number of pages9
JournalNano energy
Volume36
Publication statusPublished - 2017
Peer-reviewedYes

External IDs

Scopus 85018947307

Keywords

Library keywords