Demonstration of 1T1C FeRAM Arrays for Nonvolatile Memory Applications

Research output: Contribution to book/Conference proceedings/Anthology/ReportConference contributionContributedpeer-review

Contributors

  • Jun Okuno - , Sony Group Corporation (Author)
  • Takafumi Kunihiro - , Sony Group Corporation (Author)
  • Kenta Konishi - , Sony Group Corporation (Author)
  • Hideki Maemura - , Sony Group Corporation (Author)
  • Yusuke Shuto - , Sony Group Corporation (Author)
  • Fumitaka Sugaya - , Sony Group Corporation (Author)
  • Monica Materano - , Chair of Nanoelectronics, TUD Dresden University of Technology (Author)
  • Tarek Ali - , Fraunhofer Institute for Photonic Microsystems (Author)
  • Maximilian Lederer - , Chair of Experimental Physics / Photophysics, Fraunhofer Institute for Photonic Microsystems (Author)
  • Kati Kuehnel - , Fraunhofer Institute for Photonic Microsystems (Author)
  • Konrad Seidel - , Fraunhofer Institute for Photonic Microsystems (Author)
  • Uwe Schroeder - , TUD Dresden University of Technology (Author)
  • Thomas Mikolajick - , Chair of Nanoelectronics, TUD Dresden University of Technology (Author)
  • Masanori Tsukamoto - , Sony Group Corporation (Author)
  • Taku Umebayashi - , Sony Group Corporation (Author)

Abstract

Over the past few years, concern over high-density and low-power embedded memories has risen for various applications, such as cache memory, Internet of Things (IoT), and in-memory computing. Traditional memories, such as embedded or external flash memories, are facing the challenge of scaling down beyond 28-nm technology due to high process costs resulting from complex structures. On the contrary, magnetoresistive random access memory (MRAM) has been receiving increased attention as it can be integrated in 22-nm technology. Resistive memory requires a high switching current during write or read operations, leading to high energy consumption. To control this consumption, dedicated access devices are necessary.

Details

Original languageEnglish
Title of host publication2021 20th International Workshop on Junction Technology (IWJT)
PublisherIEEE, New York [u. a.]
ISBN (electronic)978-4-86348-779-6
ISBN (print)978-1-6654-4887-1
Publication statusPublished - 2021
Peer-reviewedYes

Publication series

Series International Workshop on Junction Technology

Conference

Title20th International Workshop on Junction Technology, IWJT 2021
Duration10 - 11 June 2021
CityVirtual, Online
CountryJapan

External IDs

ORCID /0000-0003-3814-0378/work/142256169