Demonstration of 1T1C FeRAM Arrays for Nonvolatile Memory Applications

Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/GutachtenBeitrag in KonferenzbandBeigetragenBegutachtung

Beitragende

  • Jun Okuno - , Sony Group Corporation (Autor:in)
  • Takafumi Kunihiro - , Sony Group Corporation (Autor:in)
  • Kenta Konishi - , Sony Group Corporation (Autor:in)
  • Hideki Maemura - , Sony Group Corporation (Autor:in)
  • Yusuke Shuto - , Sony Group Corporation (Autor:in)
  • Fumitaka Sugaya - , Sony Group Corporation (Autor:in)
  • Monica Materano - , Professur für Nanoelektronik, Technische Universität Dresden (Autor:in)
  • Tarek Ali - , Fraunhofer-Institut für Photonische Mikrosysteme (Autor:in)
  • Maximilian Lederer - , Professur für Experimentalphysik/Photophysik, Fraunhofer-Institut für Photonische Mikrosysteme (Autor:in)
  • Kati Kuehnel - , Fraunhofer-Institut für Photonische Mikrosysteme (Autor:in)
  • Konrad Seidel - , Fraunhofer-Institut für Photonische Mikrosysteme (Autor:in)
  • Uwe Schroeder - , Technische Universität Dresden (Autor:in)
  • Thomas Mikolajick - , Professur für Nanoelektronik, Technische Universität Dresden (Autor:in)
  • Masanori Tsukamoto - , Sony Group Corporation (Autor:in)
  • Taku Umebayashi - , Sony Group Corporation (Autor:in)

Abstract

Over the past few years, concern over high-density and low-power embedded memories has risen for various applications, such as cache memory, Internet of Things (IoT), and in-memory computing. Traditional memories, such as embedded or external flash memories, are facing the challenge of scaling down beyond 28-nm technology due to high process costs resulting from complex structures. On the contrary, magnetoresistive random access memory (MRAM) has been receiving increased attention as it can be integrated in 22-nm technology. Resistive memory requires a high switching current during write or read operations, leading to high energy consumption. To control this consumption, dedicated access devices are necessary.

Details

OriginalspracheEnglisch
Titel2021 20th International Workshop on Junction Technology (IWJT)
Herausgeber (Verlag)IEEE, New York [u. a.]
ISBN (elektronisch)978-4-86348-779-6
ISBN (Print)978-1-6654-4887-1
PublikationsstatusVeröffentlicht - 2021
Peer-Review-StatusJa

Publikationsreihe

Reihe International Workshop on Junction Technology

Konferenz

Titel20th International Workshop on Junction Technology, IWJT 2021
Dauer10 - 11 Juni 2021
StadtVirtual, Online
LandJapan

Externe IDs

ORCID /0000-0003-3814-0378/work/142256169