Complex internal bias fields in ferroelectric hafnium oxide

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • T. Schenk - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • M. Hoffmann - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Johannes Ocker - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Milan Pešić - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • T. Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • U. Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)

Details

Original languageEnglish
Pages (from-to)20224–20233
Number of pages10
JournalACS Applied Materials and Interfaces
Volume7
Issue number36
Publication statusPublished - 2015
Peer-reviewedYes

External IDs

Scopus 84941801088