Charge trapping challenges of CMOS embedded complementary FeFETs

Research output: Contribution to book/Conference proceedings/Anthology/ReportConference contributionContributedpeer-review

Contributors

  • Sven Beyer - , Global Foundries Dresden (Author)
  • Dominik Kleimaier - , Global Foundries Dresden (Author)
  • Stefan Dunkel - , Global Foundries Dresden (Author)
  • Halid Mulaosmanovic - , Global Foundries Dresden (Author)
  • Steven Soss - , Global Foundries Dresden (Author)
  • Johannes Muller - , Global Foundries Dresden (Author)
  • Zhouhang Jiang - , University of Notre Dame (Author)
  • Kai Ni - , University of Notre Dame (Author)
  • Thomas Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Haidi Zhou - , Ferroelectric Memory GmbH (Author)

Abstract

In this work, we examine one of the important wear-out effects in metal-ferroelectric-insulator-semiconductor (MFIS) ferroelectric FETs (FeFET), comparing n-type and p-type endurance cycling degradation of the devices and propose a sloshing bathtub model as physical explanation for this effect. We show that: i) polarization (PFE) switching is the main source of cycling degradation as demonstrated by severe VT-walkout through bipolar cycling with PFE switching pulses, while much less degradation without PFE switching, thus uni-polar pulsing, is observed; ii) comparing n-type and p-type cycling data, especially the n-type cycling degradation depends on the amount of interface trapped charge during the switching event, thus once ferroelectric (FE) bulk defects are fully charged up, electrons pile up at the FE/interlayer (FE/IL) interface, resulting in a steep VT increase; iii) a sloshing bathtub model is well-suited to explain the endurance degradation and can reproduce observed data; iv) this model can also explain a trapping artefact in HfO2-based MFIS/MFIM structures, often mistakenly interpreted as ferroelectric wake-up.

Details

Original languageEnglish
Title of host publication2024 IEEE International Memory Workshop, IMW 2024 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
ISBN (electronic)9798350306521
Publication statusPublished - 2024
Peer-reviewedYes

Publication series

SeriesIEEE International Memory Workshop (IMW)
ISSN2330-7978

Workshop

Title16th IEEE International Memory Workshop
Abbreviated titleIMW 2024
Conference number16
Duration12 - 15 May 2024
Website
Degree of recognitionInternational event
LocationGrand Walkerhill Seoul Hotel
CitySeoul
CountryKorea, Republic of

External IDs

ORCID /0000-0003-3814-0378/work/163295408

Keywords

Keywords

  • 28nm HKMG, endurance, FeFET, trapping