A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Jean Pierre Glauber - , Ruhr University Bochum (Author)
  • Julian Lorenz - , German Aerospace Center (DLR) (Author)
  • Ji Liu - , University College Cork (Author)
  • Björn Müller - , University of Oldenburg (Author)
  • Sebastian Bragulla - , German Aerospace Center (DLR), University of Stuttgart (Author)
  • Aleksander Kostka - , Ruhr University Bochum (Author)
  • Detlef Rogalla - , Ruhr University Bochum (Author)
  • Michael Wark - , University of Oldenburg (Author)
  • Michael Nolan - , University College Cork (Author)
  • Corinna Harms - , German Aerospace Center (DLR) (Author)
  • Anjana Devi - , Chair of Materials Chemistry (gB/IFW), Ruhr University Bochum, Leibniz Institute for Solid State and Materials Research Dresden (Author)

Abstract

In pursuit of developing alternatives for the highly polluting Haber-Bosch process for ammonia synthesis, the electrocatalytic nitrogen reduction reaction (NRR) using transition metal nitrides such as zirconium mononitride (ZrN) has been identified as a potential pathway for ammonia synthesis. In particular, specific facets of ZrN have been theoretically described as potentially active and selective for NRR. Major obstacles that need to be addressed include the synthesis of tailored catalyst materials that can activate the inert dinitrogen bond while suppressing hydrogen evolution reaction (HER) and not degrading during electrocatalysis. To tackle these challenges, a comprehensive understanding of the influence of the catalyst's structure, composition, and morphology on the NRR activity is required. This motivates the use of metal-organic chemical vapor deposition (MOCVD) as the material synthesis route as it enables catalyst nanoengineering by tailoring the process parameters. Herein, we report the fabrication of oriented and facetted crystalline ZrN thin films employing a single source precursor (SSP) MOCVD approach on silicon and glassy carbon (GC) substrates. First principles density functional theory (DFT) simulations elucidated the preferred decomposition pathway of SSP, whereas ab initio molecular dynamics simulations show that ZrN at room temperature undergoes surface oxidation with ambient O2, yielding a Zr-O-N film, which is consistent with compositional analysis using Rutherford backscattering spectrometry (RBS) in combination with nuclear reaction analysis (NRA) and X-ray photoelectron spectroscopy (XPS) depth profiling. Proof-of-principle electrochemical experiments demonstrated the applicability of the developed ZrN films on GC for NRR and qualitatively hint towards a possible activity for the electrochemical NRR in the sulfuric acid electrolyte.

Details

Original languageEnglish
Pages (from-to)15451-15464
Number of pages14
JournalDalton transactions
Volume53
Issue number37
Publication statusPublished - 4 Jul 2024
Peer-reviewedYes

External IDs

PubMed 39037344

Keywords

ASJC Scopus subject areas