Chair of Materials Chemistry (gB/IFW)
Organisational unit: Joint appointment
Organisation profile
Chair holder: Prof. Anjana Devi, Ph.D.
Related content and researchers (public profile)
- Research output
- Journals
Atomic and Molecular Layer Deposition of Nd- and Eu-Based Oxide and Hybrid Thin Films: Computationally Guided Precursor Selection
Preischel, F., Ghazy, A., Seren, M., Obenlüneschloß, J., Mullins, R., Rogalla, D. & Gemming, T. & 4 others, Nolan, M., Debus, J., Karppinen, M. & Devi, A., 12 May 2026, In: Chemistry of materials. 38, 9, p. 4422-4436 15 p.Research output: Contribution to journal › Research article › Contributed › peer-review
Amido-Amine Co(II) Precursor-Based Atomic/Molecular Layer Deposition Processes for Cobalt-Organic Thin Films and Their Thermal Conversion to CoO Thin Films
Jussila, T., Obenlüneschloß, J., Liu, J., Partanen, O., Vasala, S., Rogalla, D. & Glatzel, P. & 3 others, Nolan, M., Devi, A. & Karppinen, M., 6 May 2026, In: Advanced materials technologies. 11, 9, e02272.Research output: Contribution to journal › Research article › Contributed › peer-review
Structuring large area WS2 layers grown by atomic layer deposition
Doman, L., Boysen, N., Gemming, T., Shi, H. & Devi, A., 1 May 2026, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 44, 3, 032203.Research output: Contribution to journal › Research article › Contributed › peer-review
A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films
Preischel, F., Rönnby, K., Wilken, M., Glauber, J. P., Froeschke, S., Rogalla, D. & Gemming, T. & 4 others, Popov, A. A., Dement, P., Nolan, M. & Devi, A., 7 Apr 2026, In: Small. 22, 20, e11982.Research output: Contribution to journal › Research article › Contributed › peer-review
Defect Engineering in Atomic-Layer-Deposited Cerium Oxide
Tschammer, R., Schmickler, M., Kosto, Y., Henkel, K., Kaur, P., Devi, A. & Morales, C. & 1 others, Flege, J. I., 1 Apr 2026, In: ACS applied materials & interfaces. 18, 12, p. 18380-18393 14 p.Research output: Contribution to journal › Research article › Contributed › peer-review
Applied Surface Science Advances
ISSNs: 2666-5239
Additional searchable ISSN (electronic): 2666-5239
Elsevier Science B.V., Netherlands
Scopus rating (2025): CiteScore 15.4 SJR 1.558 SNIP 2.088
Indexed in DOAJ
Journal
Chemistry methods : new approaches to solving problems in chemistry
ISSNs: 2628-9725
Additional searchable ISSN (electronic): 2628-9725
Wiley-VCH, Weinheim [u. a.], Germany
Scopus rating (2025): CiteScore 4.2 SJR 0.856 SNIP 0.86
Journal
Angewandte Chemie : a journal of the Gesellschaft Deutscher Chemiker ; International edition
ISSNs: 1433-7851, 0570-0833
Additional searchable ISSN (electronic): 1521-3773
Wiley & Sons, Chichester [u. a.], Germany
Scopus rating (2025): CiteScore 25.7 SJR 5.495 SNIP 2.492
Journal
Advanced materials interfaces
ISSNs: 1521-3862, 0948-1907, 2196-7350
Additional searchable ISSN (electronic): 2196-7350
Wiley & Sons, Chichester [u. a.]
Scopus rating (2025): CiteScore 9.6 SJR 1.053 SNIP 0.901
Indexed in DOAJ
Journal
Inorganic Chemistry
ISSNs: 0020-1669
Additional searchable ISSN (electronic): 1520-510X
American Chemical Society
Scopus rating (2025): CiteScore 7.5 SJR 0.879 SNIP 0.873
Journal