Wetting resistance at its topographical limit: The benefit of mushroom and serif T structures

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

Details

Original languageEnglish
Pages (from-to)1100-1112
Number of pages13
JournalLangmuir
Issue number4
Publication statusPublished - 2013
Peer-reviewedYes

External IDs

researchoutputwizard legacy.publication#77162
Scopus 84873123615
ORCID /0000-0003-0189-3448/work/159607148

Keywords

Keywords

  • skin sections of Orthonychiurus stachianus are studied by transmission electron microscopy