VORRICHTUNG ZUM AUFDAMPFEN EINES BESCHICHTUNGSMATERIALS
Research output: Intellectual property › Patent application/Patent
Contributors
Abstract
The invention relates to a device for the vapour deposition of a coating material on a substrate. Said device comprises a vapour distribution chamber (115), which houses a vaporisation source and has a nozzle section (117) with an elongated shape, the length (121) of said shape being greater than or equal to the width of the substrate to be coated and the width being less than the length. In addition, the nozzle section projects away from the vapour distribution chamber to a height (123) that is greater than its width.
Details
The invention relates to a device for the vapour deposition of a coating material on a substrate. Said device comprises a vapour distribution chamber (115), which houses a vaporisation source and has a nozzle section (117) with an elongated shape, the length (121) of said shape being greater than or equal to the width of the substrate to be coated and the width being less than the length. In addition, the nozzle section projects away from the vapour distribution chamber to a height (123) that is greater than its width.
Translated title of the contribution | DEVICE FOR THE VAPOUR DEPOSITION OF A COATING MATERIAL |
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Original language | German |
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IPC (International Patent Classification) | C23C 14/ 00 A I |
Patent number | WO2006050846 |
Country/Territory | Germany |
Priority date | 9 Mar 2005 |
Priority number | DE20051010929 |
Publication status | Published - 18 May 2006 |