Verfahren zur Herstellung eines organischen Transistors und organischer Transistor

Research output: Intellectual Property › Patent application/Patent

Contributors

  • Novaled GmbH

Abstract

The invention refers to a method for producing an organic transistor, the method comprising steps of providing a first electrode (2) on a substrate (1), generating a source-drain insulator (3) assigned at least partially to the substrate (1) and/or at least partially to the first electrode (2), generating a second electrode (4) assigned to the source-drain insulator (3), depositing an organic semiconducting layer (5) on the first electrode (2), the second electrode (4), and the source-drain insulator (3), generating a gate insulator (6) assigned to the organic semiconducting layer (5), and providing a gate electrode (7) assigned to the gate insulator (6). Further, the invention relates to an organic transistor.

Translated title of the contribution
Method for producing an organic transistor and organic transistor

Details

The invention refers to a method for producing an organic transistor, the method comprising steps of providing a first electrode (2) on a substrate (1), generating a source-drain insulator (3) assigned at least partially to the substrate (1) and/or at least partially to the first electrode (2), generating a second electrode (4) assigned to the source-drain insulator (3), depositing an organic semiconducting layer (5) on the first electrode (2), the second electrode (4), and the source-drain insulator (3), generating a gate insulator (6) assigned to the organic semiconducting layer (5), and providing a gate electrode (7) assigned to the gate insulator (6). Further, the invention relates to an organic transistor.

Original languageGerman
IPC (International Patent Classification)H01L 51/ 05 A I
Patent numberEP2924754
Country/TerritoryGermany
Priority date28 Mar 2014
Priority numberEP20140162388
Publication statusPublished - 30 Sept 2015
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External IDs

ORCID /0000-0002-9773-6676/work/142659848