Verfahren zur Herstellung eines organischen Transistors und organischer Transistor

Publikation: Geistiges EigentumPatentanmeldung/Patent

Beitragende

  • Novaled GmbH

Abstract

The invention refers to a method for producing an organic transistor, the method comprising steps of providing a first electrode (2) on a substrate (1), generating a source-drain insulator (3) assigned at least partially to the substrate (1) and/or at least partially to the first electrode (2), generating a second electrode (4) assigned to the source-drain insulator (3), depositing an organic semiconducting layer (5) on the first electrode (2), the second electrode (4), and the source-drain insulator (3), generating a gate insulator (6) assigned to the organic semiconducting layer (5), and providing a gate electrode (7) assigned to the gate insulator (6). Further, the invention relates to an organic transistor.

Details

The invention refers to a method for producing an organic transistor, the method comprising steps of providing a first electrode (2) on a substrate (1), generating a source-drain insulator (3) assigned at least partially to the substrate (1) and/or at least partially to the first electrode (2), generating a second electrode (4) assigned to the source-drain insulator (3), depositing an organic semiconducting layer (5) on the first electrode (2), the second electrode (4), and the source-drain insulator (3), generating a gate insulator (6) assigned to the organic semiconducting layer (5), and providing a gate electrode (7) assigned to the gate insulator (6). Further, the invention relates to an organic transistor.

OriginalspracheDeutsch
IPC (Internationale Patentklassifikation)H01L 51/ 05 A I
VeröffentlichungsnummerEP2924754
Land/GebietDeutschland
Prioritätsdatum28 März 2014
PrioritätsnummerEP20140162388
PublikationsstatusVeröffentlicht - 30 Sept. 2015
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Externe IDs

ORCID /0000-0002-9773-6676/work/142659848