Universal Limit for Air-Stable Molecular n-Doping in Organic Semiconductors

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

Abstract

The air sensitivity of n-doped layers is crucial for the long-term stability of organic electronic devices. Although several air-stable and highly efficient n-dopants have been developed, the reason for the varying air sensitivity between different n-doped layers, in which the n-dopant molecules are dispersed, is not fully understood. In contrast to previous studies that compared the air stability of doped films with the energy levels of neat host or dopant layers, we trace back the varying degree of air sensitivity to the energy levels of integer charge transfer states (ICTCs) formed by host anions and dopant cations. Our data indicate a universal limit for the ionization energy of ICTCs above which the n-doped semiconductors are air-stable.

Details

Original languageEnglish
Pages (from-to)40566-40571
Number of pages6
JournalACS applied materials & interfaces
Volume12
Issue number36
Publication statusPublished - 9 Sept 2020
Peer-reviewedYes

External IDs

PubMed 32805922
Scopus 85090870344
ORCID /0000-0002-9773-6676/work/142247023

Keywords

Keywords

  • Fermi level, air-stable n-doping, electrical conductivity, electron trap, integer charge transfer complex, molecular doping, photoelectron spectroscopy, universal limit