Universal Limit for Air-Stable Molecular n-Doping in Organic Semiconductors

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

Abstract

The air sensitivity of n-doped layers is crucial for the long-term stability of organic electronic devices. Although several air-stable and highly efficient n-dopants have been developed, the reason for the varying air sensitivity between different n-doped layers, in which the n-dopant molecules are dispersed, is not fully understood. In contrast to previous studies that compared the air stability of doped films with the energy levels of neat host or dopant layers, we trace back the varying degree of air sensitivity to the energy levels of integer charge transfer states (ICTCs) formed by host anions and dopant cations. Our data indicate a universal limit for the ionization energy of ICTCs above which the n-doped semiconductors are air-stable.

Details

OriginalspracheEnglisch
Seiten (von - bis)40566-40571
Seitenumfang6
FachzeitschriftACS applied materials & interfaces
Jahrgang12
Ausgabenummer36
PublikationsstatusVeröffentlicht - 9 Sept. 2020
Peer-Review-StatusJa

Externe IDs

PubMed 32805922
Scopus 85090870344
ORCID /0000-0002-9773-6676/work/142247023

Schlagworte

Schlagwörter

  • Fermi level, air-stable n-doping, electrical conductivity, electron trap, integer charge transfer complex, molecular doping, photoelectron spectroscopy, universal limit