Switching in Nanoscale Hafnium Oxide-Based Ferroelectric Transistors

Research output: Contribution to book/Conference proceedings/Anthology/ReportChapter in book/Anthology/ReportContributedpeer-review

Contributors

  • Halid Mulaosmanovic - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Uwe Schroeder - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Thomas Mikolajick - , Chair of Nanoelectronics, NaMLab - Nanoelectronic materials laboratory gGmbH (Author)
  • Stefan Slesazeck - , NaMLab - Nanoelectronic materials laboratory gGmbH (Author)

Abstract

The recent advent of ferroelectricity in thin hafnium oxide films has enabled an unprecedented scaling of ferroelectric field-effect transistors (FeFETs) based on this material. However, the small-area devices, which have the channel length of only a few tens of nanometers, show some striking performance differences when compared to the large-area ones. In this chapter, the switching of these nanoscale FeFETs will be investigated. In particular, novel switching phenomena will be pointed out, including the abrupt and stepwise switching transitions, the appearance of switching stochasticity and the evidence for the accumulative switching upon identical voltage excitations. These properties not only provide new and useful insights for memory applications but also set the basis for exploiting FeFETs for novel applications, such as neuromorphic and stochastic computing.

Details

Original languageEnglish
Title of host publicationTopics in Applied Physics
PublisherSpringer
Pages97-108
Number of pages12
Publication statusPublished - 2020
Peer-reviewedYes

Publication series

SeriesTopics in Applied Physics (TAP)
Volume131
ISSN0303-4216

External IDs

ORCID /0000-0003-3814-0378/work/142256213

Keywords

ASJC Scopus subject areas