Spatially resolved cross-linking characterization by imaging low-coherence interferometry

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Christopher Taudt - , University of Applied Sciences Zwickau, Fraunhofer Institute for Material and Beam Technology (Author)
  • Bryan Nelsen - , University of Applied Sciences Zwickau, Fraunhofer Institute for Material and Beam Technology (Author)
  • Elisabeth Rossegger - , University of Leoben (Author)
  • Sandra Schlögl - , University of Leoben (Author)
  • Edmund Koch - , Department of Anesthesiology and Intensive Care Medicine (Author)
  • Peter Hartmann - , University of Applied Sciences Zwickau, Fraunhofer Institute for Material and Beam Technology (Author)

Abstract

A method to characterize cross-linking differences in polymers such as waveguide polymers has been developed. The method is based on the scan-free information acquisition utilizing a low-coherence interferometer in conjunction with an imaging spectrometer. By the introduction of a novel analyzing algorithm, the recorded spectral-phase data was interpreted as wavelength-dependent optical thickness which is matchable with the refractive index and therefore with the degree of cross-linking. In the course of this work, the method was described in its hardware and algorithmic implementation as well as in its accuracy. Comparative measurements and error estimations showed an accuracy in the range of 10−6 in terms of the refractive index. Finally, photo-lithographically produced samples with laterally defined cross-linking differences have been characterized. It could be shown, that differences in the optical thickness of ±1.5 μm are distinguishable.

Details

Original languageEnglish
Article number1152
JournalSensors (Switzerland)
Volume19
Issue number5
Publication statusPublished - 1 Mar 2019
Peer-reviewedYes

External IDs

PubMed 30866475
ORCID /0000-0003-0554-2178/work/142249908

Keywords

Keywords

  • Cross-linking characterization, Dispersion-enhanced low-coherence interferometry, Interferometry, Photoresist, Semiconductor manufacturing, White-light interferometry