Single-Layer Tl2O: A Metal-Shrouded 2D Semiconductor with High Electronic Mobility

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Yandong Ma - , Leipzig University (Author)
  • Agnieszka Kuc - , Leipzig University (Author)
  • Thomas Heine - , Leipzig University (Author)

Abstract

The first metal-shrouded two-dimensional semiconductor, single-layer Tl2O, is discussed from first principles. It is thermally and dynamically stable, has a low cleavage energy calling for exfoliation from layered Tl2O bulk, and has a very small interface mismatch compared to (001) Tl metal. Single-layer Tl2O exhibits a direct bandgap of 1.56 eV and a very high charge carrier mobility of 4.3 × 103 cm2 V-1 s-1. The metal-shrouded 2D semiconductor promises interesting applications in 2D electronics. An intriguing layer-thickness-dependent direct-to-indirect bandgap transition is observed, and contrary to early literature, the bulk is also a semiconductor.

Details

Original languageEnglish
Pages (from-to)11694-11697
Number of pages4
JournalJournal of the American Chemical Society
Volume139
Issue number34
Publication statusPublished - 30 Aug 2017
Peer-reviewedYes
Externally publishedYes

External IDs

PubMed 28820262