Single-Layer Tl2O: A Metal-Shrouded 2D Semiconductor with High Electronic Mobility
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Abstract
The first metal-shrouded two-dimensional semiconductor, single-layer Tl2O, is discussed from first principles. It is thermally and dynamically stable, has a low cleavage energy calling for exfoliation from layered Tl2O bulk, and has a very small interface mismatch compared to (001) Tl metal. Single-layer Tl2O exhibits a direct bandgap of 1.56 eV and a very high charge carrier mobility of 4.3 × 103 cm2 V-1 s-1. The metal-shrouded 2D semiconductor promises interesting applications in 2D electronics. An intriguing layer-thickness-dependent direct-to-indirect bandgap transition is observed, and contrary to early literature, the bulk is also a semiconductor.
Details
| Original language | English |
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| Pages (from-to) | 11694-11697 |
| Number of pages | 4 |
| Journal | Journal of the American Chemical Society |
| Volume | 139 |
| Issue number | 34 |
| Publication status | Published - 30 Aug 2017 |
| Peer-reviewed | Yes |
| Externally published | Yes |
External IDs
| PubMed | 28820262 |
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