Single-Layer Tl2O: A Metal-Shrouded 2D Semiconductor with High Electronic Mobility

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Yandong Ma - , Universität Leipzig (Autor:in)
  • Agnieszka Kuc - , Universität Leipzig (Autor:in)
  • Thomas Heine - , Universität Leipzig (Autor:in)

Abstract

The first metal-shrouded two-dimensional semiconductor, single-layer Tl2O, is discussed from first principles. It is thermally and dynamically stable, has a low cleavage energy calling for exfoliation from layered Tl2O bulk, and has a very small interface mismatch compared to (001) Tl metal. Single-layer Tl2O exhibits a direct bandgap of 1.56 eV and a very high charge carrier mobility of 4.3 × 103 cm2 V-1 s-1. The metal-shrouded 2D semiconductor promises interesting applications in 2D electronics. An intriguing layer-thickness-dependent direct-to-indirect bandgap transition is observed, and contrary to early literature, the bulk is also a semiconductor.

Details

OriginalspracheEnglisch
Seiten (von - bis)11694-11697
Seitenumfang4
FachzeitschriftJournal of the American Chemical Society
Jahrgang139
Ausgabenummer34
PublikationsstatusVeröffentlicht - 30 Aug. 2017
Peer-Review-StatusJa
Extern publiziertJa

Externe IDs

PubMed 28820262