Single-Layer Tl2O: A Metal-Shrouded 2D Semiconductor with High Electronic Mobility
Publikation: Beitrag in Fachzeitschrift › Forschungsartikel › Beigetragen › Begutachtung
Beitragende
Abstract
The first metal-shrouded two-dimensional semiconductor, single-layer Tl2O, is discussed from first principles. It is thermally and dynamically stable, has a low cleavage energy calling for exfoliation from layered Tl2O bulk, and has a very small interface mismatch compared to (001) Tl metal. Single-layer Tl2O exhibits a direct bandgap of 1.56 eV and a very high charge carrier mobility of 4.3 × 103 cm2 V-1 s-1. The metal-shrouded 2D semiconductor promises interesting applications in 2D electronics. An intriguing layer-thickness-dependent direct-to-indirect bandgap transition is observed, and contrary to early literature, the bulk is also a semiconductor.
Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 11694-11697 |
| Seitenumfang | 4 |
| Fachzeitschrift | Journal of the American Chemical Society |
| Jahrgang | 139 |
| Ausgabenummer | 34 |
| Publikationsstatus | Veröffentlicht - 30 Aug. 2017 |
| Peer-Review-Status | Ja |
| Extern publiziert | Ja |
Externe IDs
| PubMed | 28820262 |
|---|