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2170 Results for: "Allgemeine Chemie"

  1. Bottom-up fabrication of photoluminescent graphene quantum dots with uniform morphology

    Liu, R., Wu, D., Feng, X. & Müllen, K., 5 Oct 2011, In: Journal of the American Chemical Society. 133, 39, p. 15221-15223 3 p.

    Research output: Contribution to journal › Research article › Contributed › peer-review

  2. Published

    Molecular metal-Nx centres in porous carbon for electrocatalytic hydrogen evolution

    Liang, H. W., Brüller, S., Dong, R., Zhang, J., Feng, X. & Müllen, K., 7 Aug 2015, In: Nature communications. 6, 7992.

    Research output: Contribution to journal › Research article › Contributed › peer-review

  3. Nitrogen-doped ordered mesoporous graphitic arrays with high electrocatalytic activity for oxygen reduction

    Liu, R., Wu, D., Feng, X. & Müllen, K., 29 Mar 2010, In: Angewandte Chemie - International Edition. 49, 14, p. 2565-2569 5 p.

    Research output: Contribution to journal › Research article › Contributed › peer-review

  4. Published

    Interface-Assisted Synthesis of 2D Materials: Trend and Challenges

    Dong, R., Zhang, T. & Feng, X., 11 Jul 2018, In: Chemical reviews. 118, 13, p. 6189-6325 137 p.

    Research output: Contribution to journal › Review article › Contributed › peer-review

  5. Recent advances using guanidinate ligands for Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD) applications

    Kurek, A., Gordon, P. G., Karle, S., Devi, A. & Barry, S. T., 2014, In: Australian journal of chemistry. 67, 7, p. 989-996 8 p.

    Research output: Contribution to journal › Review article › Contributed › peer-review

  6. Urchin-like ZnO nanorod arrays for gas sensing applications

    Barreca, D., Bekermann, D., Comini, E., Devi, A., Fischer, R. A., Gasparotto, A., MacCato, C., & 3 othersSada, C., Sberveglieri, G. & Tondello, E., Nov 2010, In: CrystEngComm. 12, 11, p. 3419-3421 3 p.

    Research output: Contribution to journal › Research article › Contributed › peer-review

  7. Mononuclear precursor for MOCVD of HfO2 thin films

    Baunemann, A., Thomas, R., Becker, R., Winter, M., Fischer, R. A., Ehrhart, P., Waser, R., & 1 othersDevi, A., 2004, In: Chemical communications. 4, 14, p. 1610-1611 2 p.

    Research output: Contribution to journal › Research article › Contributed › peer-review

  8. Investigation of an atomic-layer-deposited Al2O3 diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform

    Li, Y., Zanders, D., Meischein, M., Devi, A. & Ludwig, A., Aug 2021, In: Surface and interface analysis. 53, 8, p. 727-733 7 p.

    Research output: Contribution to journal › Research article › Contributed › peer-review

  9. Fabrication of GdXFeyOz films using an atomic layer deposition-type approach

    Yu, P., Beer, S. M. J., Devi, A. & Coll, M., 21 Jan 2021, In: CrystEngComm. 23, 3, p. 730-740 11 p.

    Research output: Contribution to journal › Research article › Contributed › peer-review

  10. Atomic layer deposition of dielectric Y2O3 thin films from a homoleptic yttrium formamidinate precursor and water

    Boysen, N., Zanders, D., Berning, T., Beer, S. M. J., Rogalla, D., Bock, C. & Devi, A., 12 Jan 2021, In: RSC advances. 11, 5, p. 2565-2574 10 p.

    Research output: Contribution to journal › Research article › Contributed › peer-review

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