Mononuclear precursor for MOCVD of HfO2 thin films

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • Arne Baunemann - , Ruhr University Bochum (Author)
  • Reji Thomas - , Jülich Research Centre (Author)
  • Ralf Becker - , Ruhr University Bochum (Author)
  • Manuela Winter - , Ruhr University Bochum (Author)
  • Roland A. Fischer - , Ruhr University Bochum (Author)
  • Peter Ehrhart - , Jülich Research Centre (Author)
  • Rainer Waser - , Jülich Research Centre (Author)
  • Anjana Devi - , Ruhr University Bochum (Author)

Abstract

We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(OiPr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.

Details

Original languageEnglish
Pages (from-to)1610-1611
Number of pages2
JournalChemical communications
Volume4
Issue number14
Publication statusPublished - 2004
Peer-reviewedYes
Externally publishedYes

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