PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Abstract
This feature article presents recent results on the analysis of plasma/polymer interactions and the nucleation of ultra-thin plasma films on polymeric substrates. Because of their high importance for the understanding of such processes, in situ analytical approaches of the plasma volume as well as the plasma/substrate interfaces are introduced before the findings on plasma surface chemistry. The plasma activation of polymeric substrates is divided into the understanding of fundamental processes on model substrates and the relevance of polymer surface complexity. Concerning thin film nucleation and growth, both plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition processes as well as the combination of both processes are considered both for model substrates and technical polymers. Based on the comprehensive presentation of recent results, selective perspectives of this research field are discussed.
Details
Original language | English |
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Article number | 2300150 |
Journal | Plasma processes and polymers |
Volume | 21 |
Issue number | 2 |
Publication status | Published - Feb 2024 |
Peer-reviewed | Yes |
Externally published | Yes |
Keywords
ASJC Scopus subject areas
Keywords
- model substrates, PEALD, PECVD, plasma activation, polymer substrate, thin film growth