PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Teresa de los Arcos - , Paderborn University (Author)
  • Peter Awakowicz - , Ruhr University Bochum (Author)
  • Jan Benedikt - , Kiel University (Author)
  • Beatrix Biskup - , Ruhr University Bochum (Author)
  • Marc Böke - , Ruhr University Bochum (Author)
  • Nils Boysen - , Ruhr University Bochum, Fraunhofer Institute for Microelectronic Circuits and Systems (Author)
  • Rahel Buschhaus - , Ruhr University Bochum (Author)
  • Rainer Dahlmann - , RWTH Aachen University (Author)
  • Anjana Devi - , Ruhr University Bochum, Fraunhofer Institute for Microelectronic Circuits and Systems (Author)
  • Tobias Gergs - , Ruhr University Bochum (Author)
  • Jonathan Jenderny - , Ruhr University Bochum (Author)
  • Achim von Keudell - , Ruhr University Bochum (Author)
  • Thomas D. Kühne - , Paderborn University (Author)
  • Simon Kusmierz - , RWTH Aachen University (Author)
  • Hendrik Müller - , Paderborn University (Author)
  • Thomas Mussenbrock - , Ruhr University Bochum (Author)
  • Jan Trieschmann - , Kiel University (Author)
  • David Zanders - , Ruhr University Bochum (Author)
  • Frederik Zysk - , Paderborn University (Author)
  • Guido Grundmeier - , Paderborn University (Author)

Abstract

This feature article presents recent results on the analysis of plasma/polymer interactions and the nucleation of ultra-thin plasma films on polymeric substrates. Because of their high importance for the understanding of such processes, in situ analytical approaches of the plasma volume as well as the plasma/substrate interfaces are introduced before the findings on plasma surface chemistry. The plasma activation of polymeric substrates is divided into the understanding of fundamental processes on model substrates and the relevance of polymer surface complexity. Concerning thin film nucleation and growth, both plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition processes as well as the combination of both processes are considered both for model substrates and technical polymers. Based on the comprehensive presentation of recent results, selective perspectives of this research field are discussed.

Details

Original languageEnglish
Article number2300150
JournalPlasma processes and polymers
Volume21
Issue number2
Publication statusPublished - Feb 2024
Peer-reviewedYes
Externally publishedYes

Keywords

Keywords

  • model substrates, PEALD, PECVD, plasma activation, polymer substrate, thin film growth