PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Teresa de los Arcos - , Universität Paderborn (Autor:in)
  • Peter Awakowicz - , Ruhr-Universität Bochum (Autor:in)
  • Jan Benedikt - , Christian-Albrechts-Universität zu Kiel (CAU) (Autor:in)
  • Beatrix Biskup - , Ruhr-Universität Bochum (Autor:in)
  • Marc Böke - , Ruhr-Universität Bochum (Autor:in)
  • Nils Boysen - , Ruhr-Universität Bochum, Fraunhofer Institute for Microelectronic Circuits and Systems (Autor:in)
  • Rahel Buschhaus - , Ruhr-Universität Bochum (Autor:in)
  • Rainer Dahlmann - , RWTH Aachen University (Autor:in)
  • Anjana Devi - , Ruhr-Universität Bochum, Fraunhofer Institute for Microelectronic Circuits and Systems (Autor:in)
  • Tobias Gergs - , Ruhr-Universität Bochum (Autor:in)
  • Jonathan Jenderny - , Ruhr-Universität Bochum (Autor:in)
  • Achim von Keudell - , Ruhr-Universität Bochum (Autor:in)
  • Thomas D. Kühne - , Universität Paderborn (Autor:in)
  • Simon Kusmierz - , RWTH Aachen University (Autor:in)
  • Hendrik Müller - , Universität Paderborn (Autor:in)
  • Thomas Mussenbrock - , Ruhr-Universität Bochum (Autor:in)
  • Jan Trieschmann - , Christian-Albrechts-Universität zu Kiel (CAU) (Autor:in)
  • David Zanders - , Ruhr-Universität Bochum (Autor:in)
  • Frederik Zysk - , Universität Paderborn (Autor:in)
  • Guido Grundmeier - , Universität Paderborn (Autor:in)

Abstract

This feature article presents recent results on the analysis of plasma/polymer interactions and the nucleation of ultra-thin plasma films on polymeric substrates. Because of their high importance for the understanding of such processes, in situ analytical approaches of the plasma volume as well as the plasma/substrate interfaces are introduced before the findings on plasma surface chemistry. The plasma activation of polymeric substrates is divided into the understanding of fundamental processes on model substrates and the relevance of polymer surface complexity. Concerning thin film nucleation and growth, both plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition processes as well as the combination of both processes are considered both for model substrates and technical polymers. Based on the comprehensive presentation of recent results, selective perspectives of this research field are discussed.

Details

OriginalspracheEnglisch
Aufsatznummer2300150
FachzeitschriftPlasma processes and polymers
Jahrgang21
Ausgabenummer2
PublikationsstatusVeröffentlicht - Feb. 2024
Peer-Review-StatusJa
Extern publiziertJa

Schlagworte

Schlagwörter

  • model substrates, PEALD, PECVD, plasma activation, polymer substrate, thin film growth