Pattern Formation With Locally Active S-Type NbOx Memristors
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Abstract
The main focus of this paper is the evolution of complex behavior in a system of coupled nonlinear memristor circuits depending on the applied coupling conditions. Thereby, the parameter space for the local activity and the edge-of-chaos domain will be determined to enable the emergence of the pattern formation in locally coupled cells according to Chua's principle. Each cell includes a Niobium oxide-based memristor, which may feature a locally active behavior once it is suitably biased on the negative differential resistance region of its DC current-voltage characteristic. It will be shown that there exists a domain of parameters under which each uncoupled cell may become locally active around a stable bias state. More specifically, under these conditions, the coupled cells are on the edge-of-chaos, and can support the static and dynamic pattern formation. The emergence of such complex spatio-temporal behavior in homogeneous structures is a prerequisite for information processing. The theoretical results are confirmed by measurements as well as by the numerical simulations of the accurate device and circuit models.
Details
Original language | English |
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Pages (from-to) | 2627-2638 |
Number of pages | 12 |
Journal | IEEE Transactions on Circuits and Systems : a publication of the IEEE Circuits and Systems Society. 1, Regular Papers |
Publication status | Published - 14 Feb 2019 |
Peer-reviewed | Yes |
External IDs
Scopus | 85067914821 |
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ORCID | /0000-0001-7436-0103/work/142240233 |
ORCID | /0000-0003-1830-0370/work/142241784 |
ORCID | /0000-0003-3814-0378/work/142256097 |