Pattern Formation With Locally Active S-Type NbOx Memristors

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

Abstract

The main focus of this paper is the evolution of complex behavior in a system of coupled nonlinear memristor circuits depending on the applied coupling conditions. Thereby, the parameter space for the local activity and the edge-of-chaos domain will be determined to enable the emergence of the pattern formation in locally coupled cells according to Chua's principle. Each cell includes a Niobium oxide-based memristor, which may feature a locally active behavior once it is suitably biased on the negative differential resistance region of its DC current-voltage characteristic. It will be shown that there exists a domain of parameters under which each uncoupled cell may become locally active around a stable bias state. More specifically, under these conditions, the coupled cells are on the edge-of-chaos, and can support the static and dynamic pattern formation. The emergence of such complex spatio-temporal behavior in homogeneous structures is a prerequisite for information processing. The theoretical results are confirmed by measurements as well as by the numerical simulations of the accurate device and circuit models.

Details

Original languageEnglish
Pages (from-to)2627-2638
Number of pages12
JournalIEEE Transactions on Circuits and Systems : a publication of the IEEE Circuits and Systems Society. 1, Regular Papers
Publication statusPublished - 14 Feb 2019
Peer-reviewedYes

External IDs

Scopus 85067914821
ORCID /0000-0001-7436-0103/work/142240233
ORCID /0000-0003-1830-0370/work/142241784
ORCID /0000-0003-3814-0378/work/142256097

Keywords