Optimizing the thin film morphology of organic fieldeffect transistors: The influence of molecular structure and vacuum deposition parameters on device performance

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Jason Locklin - , Stanford University (Author)
  • Mark E. Roberts - , Stanford University (Author)
  • Stefan C.B. Mannsfeld - , Stanford University (Author)
  • Zhenan Bao - , Stanford University (Author)

Abstract

This work highlights recent literature dealing with the fabrication of field-effect transistors from the vacuum deposition of organic semiconductors. We pay special attention to recent advances in molecular design and specific ways that synthesis has been used to tune crystal packing, and thus charge transport, in organic semiconductors. This work also looks into the fundamental processes of nucleation and growth of organic semiconductors that are deposited by vacuum deposition. The parameters that affect the morphology of the corresponding films are discussed in detail. We also provide specific examples from a family of fluorene-thiophene containing oligomers that correlate the molecular structure to device performance.

Details

Original languageEnglish
Pages (from-to)79-101
Number of pages23
JournalPolymer Reviews
Volume46
Issue number1
Publication statusPublished - Jan 2006
Peer-reviewedYes
Externally publishedYes

Keywords

Research priority areas of TU Dresden

Sustainable Development Goals

Keywords

  • Fieldeffect mobility, Fieldeffect transistor, Nucleation and growth, Organic semiconductor, Thin film morphology, Vacuum deposition