Optimizing the thin film morphology of organic fieldeffect transistors: The influence of molecular structure and vacuum deposition parameters on device performance

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Jason Locklin - , Stanford University (Autor:in)
  • Mark E. Roberts - , Stanford University (Autor:in)
  • Stefan C.B. Mannsfeld - , Stanford University (Autor:in)
  • Zhenan Bao - , Stanford University (Autor:in)

Abstract

This work highlights recent literature dealing with the fabrication of field-effect transistors from the vacuum deposition of organic semiconductors. We pay special attention to recent advances in molecular design and specific ways that synthesis has been used to tune crystal packing, and thus charge transport, in organic semiconductors. This work also looks into the fundamental processes of nucleation and growth of organic semiconductors that are deposited by vacuum deposition. The parameters that affect the morphology of the corresponding films are discussed in detail. We also provide specific examples from a family of fluorene-thiophene containing oligomers that correlate the molecular structure to device performance.

Details

OriginalspracheEnglisch
Seiten (von - bis)79-101
Seitenumfang23
FachzeitschriftPolymer Reviews
Jahrgang46
Ausgabenummer1
PublikationsstatusVeröffentlicht - Jan. 2006
Peer-Review-StatusJa
Extern publiziertJa

Schlagworte

Forschungsprofillinien der TU Dresden

Ziele für nachhaltige Entwicklung

Schlagwörter

  • Fieldeffect mobility, Fieldeffect transistor, Nucleation and growth, Organic semiconductor, Thin film morphology, Vacuum deposition