Optimizing the thin film morphology of organic fieldeffect transistors: The influence of molecular structure and vacuum deposition parameters on device performance
Publikation: Beitrag in Fachzeitschrift › Forschungsartikel › Beigetragen › Begutachtung
Beitragende
Abstract
This work highlights recent literature dealing with the fabrication of field-effect transistors from the vacuum deposition of organic semiconductors. We pay special attention to recent advances in molecular design and specific ways that synthesis has been used to tune crystal packing, and thus charge transport, in organic semiconductors. This work also looks into the fundamental processes of nucleation and growth of organic semiconductors that are deposited by vacuum deposition. The parameters that affect the morphology of the corresponding films are discussed in detail. We also provide specific examples from a family of fluorene-thiophene containing oligomers that correlate the molecular structure to device performance.
Details
Originalsprache | Englisch |
---|---|
Seiten (von - bis) | 79-101 |
Seitenumfang | 23 |
Fachzeitschrift | Polymer Reviews |
Jahrgang | 46 |
Ausgabenummer | 1 |
Publikationsstatus | Veröffentlicht - Jan. 2006 |
Peer-Review-Status | Ja |
Extern publiziert | Ja |
Schlagworte
Forschungsprofillinien der TU Dresden
Ziele für nachhaltige Entwicklung
ASJC Scopus Sachgebiete
Schlagwörter
- Fieldeffect mobility, Fieldeffect transistor, Nucleation and growth, Organic semiconductor, Thin film morphology, Vacuum deposition