On the homogenization of the thickness of Cu deposits by means of MHD convection within small dimension cells

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

Abstract

The influence of magnetohydrodynamic (MHD) convection on the thickness of an electrochemically deposited copper layer along a vertical plane cathode is examined. A magnetic gradient field, that induces a Lorentz force, establishes a vortical motion of the electrolyte which can be oriented either antiparallel or parallel to the natural convection. For the latter case, we show both experimentally and numerically that a sufficiently strong Lorentz force levels the inhomogeneities of the deposit thickness characteristic for deposition under pure natural convection.

Details

Original languageEnglish
Pages (from-to)80-83
Number of pages4
JournalElectrochemistry Communications
Volume36
Publication statusPublished - 2013
Peer-reviewedYes

External IDs

ORCID /0000-0003-1653-5686/work/173052431
ORCID /0000-0002-4179-2273/work/173053898

Keywords

ASJC Scopus subject areas

Keywords

  • Electrochemical deposition, Forced convection, Lorentz force, Magnetoelectrochemistry, Mass transport, MHD