On the homogenization of the thickness of Cu deposits by means of MHD convection within small dimension cells

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

Abstract

The influence of magnetohydrodynamic (MHD) convection on the thickness of an electrochemically deposited copper layer along a vertical plane cathode is examined. A magnetic gradient field, that induces a Lorentz force, establishes a vortical motion of the electrolyte which can be oriented either antiparallel or parallel to the natural convection. For the latter case, we show both experimentally and numerically that a sufficiently strong Lorentz force levels the inhomogeneities of the deposit thickness characteristic for deposition under pure natural convection.

Details

OriginalspracheEnglisch
Seiten (von - bis)80-83
Seitenumfang4
FachzeitschriftElectrochemistry Communications
Jahrgang36
PublikationsstatusVeröffentlicht - 2013
Peer-Review-StatusJa

Externe IDs

ORCID /0000-0003-1653-5686/work/173052431
ORCID /0000-0002-4179-2273/work/173053898

Schlagworte

ASJC Scopus Sachgebiete

Schlagwörter

  • Electrochemical deposition, Forced convection, Lorentz force, Magnetoelectrochemistry, Mass transport, MHD