Near-field optical characterization of surface-plasmon-mediated light emission from electrically biased metal-insulator-semiconductor tunnel junctions
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Contributors
Abstract
We report on near-field optical observations of surface-plasmon-mediated light emission in electrically biased metal-insulator-semiconductor (MIS) tunnel junctions fabricated from Au and p -type Si with a native oxide layer as the tunneling barrier. Our junctions exhibit stable broadband macroscopic light emission in the visible spectrum. Inspection of the optical near-field reveals highly localized hot spots due to local plasmon excitation and scattering, which are investigated with spectral distinction. Such MIS tunneling junctions are compatible with common complementary metal-oxide semiconductor technology and thus open up an interesting route toward the development of novel integrated optoelectronic and plasmonic devices.
Details
| Original language | English |
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| Article number | 103123 |
| Journal | Applied physics letters |
| Volume | 92 |
| Issue number | 10 |
| Publication status | Published - 2008 |
| Peer-reviewed | Yes |
External IDs
| ORCID | /0000-0002-2484-4158/work/175744061 |
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