Near-field optical characterization of surface-plasmon-mediated light emission from electrically biased metal-insulator-semiconductor tunnel junctions

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • J. Seidel - , TUD Dresden University of Technology, University of California at Berkeley (Author)
  • T. Göhler - , TUD Dresden University of Technology (Author)
  • S. Grafström - , TUD Dresden University of Technology (Author)
  • L. M. Eng - , Chair of Experimental Physics / Photophysics (Author)

Abstract

We report on near-field optical observations of surface-plasmon-mediated light emission in electrically biased metal-insulator-semiconductor (MIS) tunnel junctions fabricated from Au and p -type Si with a native oxide layer as the tunneling barrier. Our junctions exhibit stable broadband macroscopic light emission in the visible spectrum. Inspection of the optical near-field reveals highly localized hot spots due to local plasmon excitation and scattering, which are investigated with spectral distinction. Such MIS tunneling junctions are compatible with common complementary metal-oxide semiconductor technology and thus open up an interesting route toward the development of novel integrated optoelectronic and plasmonic devices.

Details

Original languageEnglish
Article number103123
JournalApplied physics letters
Volume92
Issue number10
Publication statusPublished - 2008
Peer-reviewedYes

External IDs

ORCID /0000-0002-2484-4158/work/175744061

Keywords

ASJC Scopus subject areas