Evaluation of negative photo-patternable PDMS for the encapsulation of neural electrodes
Research output: Contribution to book/conference proceedings/anthology/report › Conference contribution › Contributed › peer-review
Contributors
Abstract
This communication examines the suitability of a photo-patternable polydimethylsiloxane (PP-PDMS) elastomer as an insulating material for implantable microelectrodes. PP-PDMS is produced by mixing a photoinitiator (2-hydroxy-2-methylpropiophenone) with the PDMS base and curing agent. Subsequent exposure to UV radiation and development of the elastomeric photo-resist allows for the definition of well-defined openings within the PP-PDMS film. The dielectric constants of PP-PDMS and PDMS are similar (ε ≈ 2.6, f 1MHz). Gold film microelectrodes patterned on glass or a PDMS substrate are encapsulated with PP-PDMS, while recording sites as small as 104 m2 can be obtained in the PP-PDMS layer. The cytotoxicity of the PP-PDMS was preliminary tested in vitro by culturing 3T3 fibroblasts in PP-PDMS extracts. No adverse effects were observed in cultures exposed to PP-PDMS films initially leached in isopropanol solvent for 48h.
Details
| Original language | English |
|---|---|
| Title of host publication | 2011 5th International IEEE/EMBS Conference on Neural Engineering, NER 2011 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 490-494 |
| Number of pages | 5 |
| ISBN (electronic) | 978-1-4244-4141-9 |
| ISBN (print) | 978-1-4244-4140-2 |
| Publication status | Published - 2011 |
| Peer-reviewed | Yes |
| Externally published | Yes |
Publication series
| Series | International IEEE/EMBS Conference on Neural Engineering, CNE |
|---|
Conference
| Title | 2011 5th International IEEE/EMBS Conference on Neural Engineering, NER 2011 |
|---|---|
| Duration | 27 April - 1 May 2011 |
| City | Cancun |
| Country | Mexico |