Evaluation of negative photo-patternable PDMS for the encapsulation of neural electrodes
Publikation: Beitrag in Buch/Konferenzbericht/Sammelband/Gutachten › Beitrag in Konferenzband › Beigetragen › Begutachtung
Beitragende
Abstract
This communication examines the suitability of a photo-patternable polydimethylsiloxane (PP-PDMS) elastomer as an insulating material for implantable microelectrodes. PP-PDMS is produced by mixing a photoinitiator (2-hydroxy-2-methylpropiophenone) with the PDMS base and curing agent. Subsequent exposure to UV radiation and development of the elastomeric photo-resist allows for the definition of well-defined openings within the PP-PDMS film. The dielectric constants of PP-PDMS and PDMS are similar (ε ≈ 2.6, f 1MHz). Gold film microelectrodes patterned on glass or a PDMS substrate are encapsulated with PP-PDMS, while recording sites as small as 104 m2 can be obtained in the PP-PDMS layer. The cytotoxicity of the PP-PDMS was preliminary tested in vitro by culturing 3T3 fibroblasts in PP-PDMS extracts. No adverse effects were observed in cultures exposed to PP-PDMS films initially leached in isopropanol solvent for 48h.
Details
Originalsprache | Englisch |
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Titel | 2011 5th International IEEE/EMBS Conference on Neural Engineering, NER 2011 |
Herausgeber (Verlag) | Institute of Electrical and Electronics Engineers Inc. |
Seiten | 490-494 |
Seitenumfang | 5 |
ISBN (elektronisch) | 978-1-4244-4141-9 |
ISBN (Print) | 978-1-4244-4140-2 |
Publikationsstatus | Veröffentlicht - 2011 |
Peer-Review-Status | Ja |
Extern publiziert | Ja |
Publikationsreihe
Reihe | International IEEE/EMBS Conference on Neural Engineering, CNE |
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Konferenz
Titel | 2011 5th International IEEE/EMBS Conference on Neural Engineering, NER 2011 |
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Dauer | 27 April - 1 Mai 2011 |
Stadt | Cancun |
Land | Mexiko |