Direct patterning of polystyrene-polymethyl methacrylate copolymer by means of laser interference lithography using UV laser irradiation

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • A. F. Lasagni - , Saarland University, Georgia Institute of Technology (Author)
  • D. F. Acevedo - , Saarland University, Universidad Nacional de Rio Cuarto (Author)
  • C. A. Barbero - , Universidad Nacional de Rio Cuarto (Author)
  • F. Mücklich - , Saarland University (Author)

Abstract

The fabrication of functionalized surfaces on polymeric substrates is of importance in chemistry, biology, physics, and material science. Examples of functional surfaces are micro/nano periodic arrays that can be fabricated using different methods. However, many of these techniques require several fabrication steps. In this communication, we report the fabrication of advanced architectures in poly(methylmethacrylate)-poly-styrene (PMMA-PS) copolymers using direct laser Interference patterning. Because of the mixed optical properties of the copolymers, a different type of periodic architectures could be fabricated when compared with traditional pyre polymers. This new type of periodic structures results from the local swelling of the copolymer dye to the formation of gaseous products induced by the laser radiation. Additionally, relatively low laser fluences are necessary to initiate the ablation process of the copolymers.

Details

Original languageEnglish
Pages (from-to)2367-2372
Number of pages6
JournalPolymer engineering and science
Volume48
Issue number12
Publication statusPublished - Dec 2008
Peer-reviewedYes
Externally publishedYes

External IDs

ORCID /0000-0003-4333-4636/work/219975417