Direct patterning of polystyrene-polymethyl methacrylate copolymer by means of laser interference lithography using UV laser irradiation

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • A. F. Lasagni - , Universität des Saarlandes, Georgia Institute of Technology (Autor:in)
  • D. F. Acevedo - , Universität des Saarlandes, Universidad Nacional de Rio Cuarto (Autor:in)
  • C. A. Barbero - , Universidad Nacional de Rio Cuarto (Autor:in)
  • F. Mücklich - , Universität des Saarlandes (Autor:in)

Abstract

The fabrication of functionalized surfaces on polymeric substrates is of importance in chemistry, biology, physics, and material science. Examples of functional surfaces are micro/nano periodic arrays that can be fabricated using different methods. However, many of these techniques require several fabrication steps. In this communication, we report the fabrication of advanced architectures in poly(methylmethacrylate)-poly-styrene (PMMA-PS) copolymers using direct laser Interference patterning. Because of the mixed optical properties of the copolymers, a different type of periodic architectures could be fabricated when compared with traditional pyre polymers. This new type of periodic structures results from the local swelling of the copolymer dye to the formation of gaseous products induced by the laser radiation. Additionally, relatively low laser fluences are necessary to initiate the ablation process of the copolymers.

Details

OriginalspracheEnglisch
Seiten (von - bis)2367-2372
Seitenumfang6
FachzeitschriftPolymer engineering and science
Jahrgang48
Ausgabenummer12
PublikationsstatusVeröffentlicht - Dez. 2008
Peer-Review-StatusJa
Extern publiziertJa

Externe IDs

ORCID /0000-0003-4333-4636/work/219975417