Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis

Research output: Contribution to journal › Research article › Contributed › peer-review

Contributors

  • James Hirst - , Helmholtz Centre Berlin for Materials and Energy (Author)
  • Sönke Müller - , Helmholtz Centre Berlin for Materials and Energy (Author)
  • Daniel Peeters - , Ruhr University Bochum (Author)
  • Alexander Sadlo - , Ruhr University Bochum (Author)
  • Lukas Mai - , Ruhr University Bochum (Author)
  • Oliver Mendoza Reyes - , Ulm University (Author)
  • Dennis Friedrich - , Helmholtz Centre Berlin for Materials and Energy (Author)
  • Dariusz Mitoraj - , Ulm University (Author)
  • Anjana Devi - , Ruhr University Bochum (Author)
  • Radim Beranek - , Ulm University (Author)
  • Rainer Eichberger - , Helmholtz Centre Berlin for Materials and Energy (Author)

Abstract

The temporal evolution of photogenerated carriers in CuWO4, CuO and WO3 thin films deposited via a direct chemical vapor deposition approach was studied using time-resolved microwave conductivity and terahertz spectroscopy to obtain the photocarrier lifetime, mobility and diffusion length. The carrier transport properties of the films prepared by varying the copper-to-tungsten stoichiometry were compared and the results related to the performance of the compositions built into respective photoelectrochemical cells. Superior carrier mobility was observed for CuWO4 under frontside illumination.

Details

Original languageEnglish
Pages (from-to)699-717
Number of pages19
JournalZeitschrift fur Physikalische Chemie
Publication statusPublished - 2019
Peer-reviewedYes
Externally publishedYes

Keywords

ASJC Scopus subject areas

Keywords

  • carrier dynamics, CuWO, CVD, Metal oxides, photoelectrocatalysis, thin films, TRMC