Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis
Publikation: Beitrag in Fachzeitschrift › Forschungsartikel › Beigetragen › Begutachtung
Beitragende
Abstract
The temporal evolution of photogenerated carriers in CuWO4, CuO and WO3 thin films deposited via a direct chemical vapor deposition approach was studied using time-resolved microwave conductivity and terahertz spectroscopy to obtain the photocarrier lifetime, mobility and diffusion length. The carrier transport properties of the films prepared by varying the copper-to-tungsten stoichiometry were compared and the results related to the performance of the compositions built into respective photoelectrochemical cells. Superior carrier mobility was observed for CuWO4 under frontside illumination.
Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 699-717 |
| Seitenumfang | 19 |
| Fachzeitschrift | Zeitschrift fur Physikalische Chemie |
| Publikationsstatus | Veröffentlicht - 2019 |
| Peer-Review-Status | Ja |
| Extern publiziert | Ja |
Schlagworte
ASJC Scopus Sachgebiete
Schlagwörter
- carrier dynamics, CuWO, CVD, Metal oxides, photoelectrocatalysis, thin films, TRMC