Bauelementanordnung

Research output: Intellectual propertyPatent application/Patent

Contributors

Abstract

Various embodiments provide a component arrangement, said component arrangement comprising: a carrier (102), wherein at least one electronic component (108) is formed in the carrier (102); a first metallization layer (116) over the carrier (102), wherein the first metallization layer (116) has a first metallic coupling structure (122), which is electrically coupled to the at least one electronic component (108); a second metallization layer (128) over the first metallization layer (116), wherein the second metallization layer (128) has a second metallic coupling structure (132), wherein the first metallic coupling structure (122) is coupled to the second metallic coupling structure (132) by means of at least one via (134); and a plurality of additional vias (136, 138), which extend at least between the first metallization layer (116) and the second metallization layer (128) and are electrically conductively coupled to one another in such a way that they form a coil (152), which has a coil region (154) which is at an angle to the main processing surface of the carrier (102).

Translated title of the contribution
COMPONENT ARRANGEMENT

Details

Various embodiments provide a component arrangement, said component arrangement comprising: a carrier (102), wherein at least one electronic component (108) is formed in the carrier (102); a first metallization layer (116) over the carrier (102), wherein the first metallization layer (116) has a first metallic coupling structure (122), which is electrically coupled to the at least one electronic component (108); a second metallization layer (128) over the first metallization layer (116), wherein the second metallization layer (128) has a second metallic coupling structure (132), wherein the first metallic coupling structure (122) is coupled to the second metallic coupling structure (132) by means of at least one via (134); and a plurality of additional vias (136, 138), which extend at least between the first metallization layer (116) and the second metallization layer (128) and are electrically conductively coupled to one another in such a way that they form a coil (152), which has a coil region (154) which is at an angle to the main processing surface of the carrier (102).

Original languageGerman
IPC (International Patent Classification)H01L 23/ 522 A I
Patent numberWO2014207051A1
Country/TerritoryGermany
Priority date26 Jun 2013
Priority numberDE201310106693
Publication statusPublished - 31 Dec 2014
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External IDs

ORCID /0000-0002-1851-6828/work/142660961

Keywords

Research priority areas of TU Dresden