A Method for Producing an Organic Field Effect Transistor and an Organic Field Effect Transistor
Research output: Intellectual property › Patent application/Patent
Contributors
- Novaled GmbH
Abstract
The disclosure relates to a method for producing an organic field effect transistor, including providing a gate electrode and a gate insulator, depositing a first organic semiconducting layer on the gate insulator, generating a first electrode and an electrode insulator assigned to the first electrode for electrical insulation, depositing a second organic semiconducting layer on the first organic semiconducting layer and the electrode insulator, and generating a second electrode. Furthermore, an organic field effect transistor is provided.
Details
The disclosure relates to a method for producing an organic field effect transistor, including providing a gate electrode and a gate insulator, depositing a first organic semiconducting layer on the gate insulator, generating a first electrode and an electrode insulator assigned to the first electrode for electrical insulation, depositing a second organic semiconducting layer on the first organic semiconducting layer and the electrode insulator, and generating a second electrode. Furthermore, an organic field effect transistor is provided.
Original language | English |
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IPC (International Patent Classification) | H01L 51/ 10 A I |
Patent number | US2016049603 |
Country/Territory | Germany |
Priority date | 15 Apr 2014 |
Priority number | WO2014EP57651 |
Publication status | Published - 18 Feb 2016 |
External IDs
ORCID | /0000-0002-9773-6676/work/142659823 |
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