A Method for Producing an Organic Field Effect Transistor and an Organic Field Effect Transistor
Publikation: Geistiges Eigentum › Patentanmeldung/Patent
Beitragende
- Novaled GmbH
Abstract
The disclosure relates to a method for producing an organic field effect transistor, including providing a gate electrode and a gate insulator, depositing a first organic semiconducting layer on the gate insulator, generating a first electrode and an electrode insulator assigned to the first electrode for electrical insulation, depositing a second organic semiconducting layer on the first organic semiconducting layer and the electrode insulator, and generating a second electrode. Furthermore, an organic field effect transistor is provided.
Details
The disclosure relates to a method for producing an organic field effect transistor, including providing a gate electrode and a gate insulator, depositing a first organic semiconducting layer on the gate insulator, generating a first electrode and an electrode insulator assigned to the first electrode for electrical insulation, depositing a second organic semiconducting layer on the first organic semiconducting layer and the electrode insulator, and generating a second electrode. Furthermore, an organic field effect transistor is provided.
Originalsprache | Englisch |
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IPC (Internationale Patentklassifikation) | H01L 51/ 10 A I |
Veröffentlichungsnummer | US2016049603 |
Land/Gebiet | Deutschland |
Prioritätsdatum | 15 Apr. 2014 |
Prioritätsnummer | WO2014EP57651 |
Publikationsstatus | Veröffentlicht - 18 Feb. 2016 |
Externe IDs
ORCID | /0000-0002-9773-6676/work/142659823 |
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