A Low-temperature Process for Device-quality Si/sio2 Interfaces on Si(111)
Research output: Contribution to book/Conference proceedings/Anthology/Report › Conference contribution › Contributed › peer-review
Contributors
Details
Original language | English |
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Title of host publication | Materials Research Society Symposium Proceedings |
Pages | 375-380 |
Number of pages | 6 |
Volume | 315 |
Publication status | Published - 1993 |
Peer-reviewed | Yes |
Publication series
Series | MRS online proceedings library |
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ISSN | 0272-9172 |
External IDs
Scopus | 0027808769 |
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