A Low-temperature Process for Device-quality Si/sio2 Interfaces on Si(111)

Research output: Contribution to book/Conference proceedings/Anthology/Report › Conference contribution › Contributed › peer-review

Contributors

  • T YASUDA - (Author)
  • DR LEE - (Author)
  • CH BJORKMAN - (Author)
  • Y MA - (Author)
  • G LUCOVSKY - (Author)
  • U EMMERICHS - (Author)
  • C MEYER - , Chair of Space Systems (Author)
  • K LEO - , Nokia Bell Laboratories Inc. (Author)
  • H KURZ - (Author)

Details

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages375-380
Number of pages6
Volume315
Publication statusPublished - 1993
Peer-reviewedYes

Publication series

SeriesMRS online proceedings library
ISSN0272-9172

External IDs

Scopus 0027808769

Keywords