A compact model for the grounded-gate nMOS transistor behaviour under CDM ESD stress
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Abstract
The parasitic bipolar transistor inherent to grounded gate nMOS transistors is modelled, accounting for the specific conditions applied by CDM ESD stress. The avalanching of both, drain and source, the triggering of snapback and the CDM-specific bipolar saturation mode are addressed. Furthermore, a fast analytical method to determine CDM ESD lumped tester parasitics from measured pulse characteristics is presented. The triggering of the grounded gate nMOS transistor under CDM is studied in detail for different gate lengths. The optimal gate length for CDM protection in advanced submicron technologies is discussed.
Details
Original language | English |
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Pages (from-to) | 351-381 |
Number of pages | 31 |
Journal | Journal of Electrostatics |
Volume | 42 |
Issue number | 4 |
Publication status | Published - Jan 1998 |
Peer-reviewed | Yes |
Externally published | Yes |
External IDs
ORCID | /0000-0002-0757-3325/work/139064987 |
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Keywords
ASJC Scopus subject areas
Keywords
- CDM, Circuit simulation, Compact model, ESD protection