A compact model for the grounded-gate nMOS transistor behaviour under CDM ESD stress

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Christian Russ - , Interuniversitair Micro-Elektronica Centrum (Author)
  • Koen Verhaege - , Interuniversitair Micro-Elektronica Centrum, Sarnoff Corporation (Author)
  • Karlheinz Bock - , Interuniversitair Micro-Elektronica Centrum (Author)
  • Philippe J. Roussel - , Interuniversitair Micro-Elektronica Centrum (Author)
  • Guido Groeseneken - , Interuniversitair Micro-Elektronica Centrum (Author)
  • Herman E. Maes - , Interuniversitair Micro-Elektronica Centrum (Author)

Abstract

The parasitic bipolar transistor inherent to grounded gate nMOS transistors is modelled, accounting for the specific conditions applied by CDM ESD stress. The avalanching of both, drain and source, the triggering of snapback and the CDM-specific bipolar saturation mode are addressed. Furthermore, a fast analytical method to determine CDM ESD lumped tester parasitics from measured pulse characteristics is presented. The triggering of the grounded gate nMOS transistor under CDM is studied in detail for different gate lengths. The optimal gate length for CDM protection in advanced submicron technologies is discussed.

Details

Original languageEnglish
Pages (from-to)351-381
Number of pages31
JournalJournal of Electrostatics
Volume42
Issue number4
Publication statusPublished - Jan 1998
Peer-reviewedYes
Externally publishedYes

External IDs

ORCID /0000-0002-0757-3325/work/139064987