A compact model for the grounded-gate nMOS transistor behaviour under CDM ESD stress

Publikation: Beitrag in FachzeitschriftForschungsartikelBeigetragenBegutachtung

Beitragende

  • Christian Russ - , Interuniversitair Micro-Elektronica Centrum (Autor:in)
  • Koen Verhaege - , Interuniversitair Micro-Elektronica Centrum, Sarnoff Corporation (Autor:in)
  • Karlheinz Bock - , Interuniversitair Micro-Elektronica Centrum (Autor:in)
  • Philippe J. Roussel - , Interuniversitair Micro-Elektronica Centrum (Autor:in)
  • Guido Groeseneken - , Interuniversitair Micro-Elektronica Centrum (Autor:in)
  • Herman E. Maes - , Interuniversitair Micro-Elektronica Centrum (Autor:in)

Abstract

The parasitic bipolar transistor inherent to grounded gate nMOS transistors is modelled, accounting for the specific conditions applied by CDM ESD stress. The avalanching of both, drain and source, the triggering of snapback and the CDM-specific bipolar saturation mode are addressed. Furthermore, a fast analytical method to determine CDM ESD lumped tester parasitics from measured pulse characteristics is presented. The triggering of the grounded gate nMOS transistor under CDM is studied in detail for different gate lengths. The optimal gate length for CDM protection in advanced submicron technologies is discussed.

Details

OriginalspracheEnglisch
Seiten (von - bis)351-381
Seitenumfang31
FachzeitschriftJournal of Electrostatics
Jahrgang42
Ausgabenummer4
PublikationsstatusVeröffentlicht - Jan. 1998
Peer-Review-StatusJa
Extern publiziertJa

Externe IDs

ORCID /0000-0002-0757-3325/work/139064987