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Journal of vacuum science & technology. A. Vacuum, surfaces, and films

ISSNs: 0734-2101

Additional searchable ISSN (electronic): 1520-8559

AVS Science and Technology Society, United States of America

Scopus rating (2023): CiteScore 5.1 SJR 0.569 SNIP 0.957

Journal

Titles	Journal of vacuum science & technology. A. Vacuum, surfaces, and films Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films Journal of Vacuum Science and Technology A Journal of Vacuum Science & Technology A
Additional searchable titles	J. OF VACUUM SCIENCE & TECHNOLOGY A, J. VAC, SCI. & TECHNOL. A, J. VAC, SCI. & TECHNOL. A PART I, J. VAC, SCI. & TECHNOL. A PART II, J. VAC. SCI. & TECHNOL., J. VAC. SCI. & TECHNOL. A, J. VAC. SCI. & TECHNOL. A, PART I, J. VAC. SCI. & TECHNOL. A, PART III, J. VAC. SCI. & TECHNOL. A., J. Vac. Sci. Technol. A, J. VAC. SCI.& TECHNOL. A, J. VACUUM SCI. & TECHNOL. A, J. VACUUM SCIENCE & TECHNOLOGY A, J. VACUUM SCIENCE & TECHNOLOGY A., Journal of Vacuum Science & Technology A, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Journal of Vacuum Science & Technology, A, Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society, Journal of Vacuum Science and Technology A, journal of vacuum science and technology a: vacuum, surfaces and films, Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
ISSNs	0734-2101
Additional searchable ISSN (electronic)	1520-8559
Publisher	AVS Science and Technology Society
Country/Territory	United States of America
ZDB-ID	797704-9
ZDB-ID	1475424-1

Keywords

ASJC Scopus subject areas

Library keywords

530 Physics

Related content

Research output

Correlating elemental compositions and charge carrier profiles in ultra-pure GaN/AlGaN stacks grown by molecular beam epitaxy

Schmult, S., Appelt, P., Silva, C., Wirth, S., Wachowiak, A., Großer, A. & Mikolajick, T., 1 Jul 2023, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 41, 4, 5 p., 042702.

Research output: Contribution to journal › Research article › Contributed › peer-review

In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride

Reif, J., Knaut, M., Killge, S., Albert, M., Mikolajick, T. & Bartha, J. W., 1 May 2022, In: Journal of Vacuum Science & Technology A. 40, 3, 032602.

Research output: Contribution to journal › Research article › Contributed › peer-review

Hole selective nickel oxide as transparent conductive oxide

Tröger, D., Reif, J., Mikolajick, T. & Grube, M., 7 Dec 2021, In: Journal of Vacuum Science & Technology A. 40, 1, 013409.

Research output: Contribution to journal › Research article › Contributed › peer-review

Many routes to ferroelectric HfO2: A review of current deposition methods

Hsain, H. A., Lee, Y., Materano, M., Mittmann, T., Payne, A., Mikolajick, T., Schroeder, U., & 2 othersParsons, G. N. & Jones, J. L., 1 Dec 2021, In: Journal of Vacuum Science & Technology A. 40, 1, 010803.

Research output: Contribution to journal › Research article › Contributed › peer-review

(^tBuN)SiMe₂NMe₂-A new N,N′-κ₂-monoanionic ligand for atomic layer deposition precursors

Griffiths, M. B. E., Zanders, D., Land, M. A., Masuda, J. D., Devi, A. & Barry, S. T., 1 May 2021, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 39, 3, 795.

Research output: Contribution to journal › Research article › Contributed › peer-review

View all research output (13)