Surface Modification of Bismuth by ALD of Antimony Oxide for Suppressing Lattice Thermal Conductivity

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Shiyang He - , Chair of Metallic Materials and Metal Physics, Leibniz Institute for Solid State and Materials Research Dresden, TUD Dresden University of Technology (Author)
  • Jun Yang - , Chair of Metallic Materials and Metal Physics, Leibniz Institute for Solid State and Materials Research Dresden, TUD Dresden University of Technology (Author)
  • Amin Bahrami - , Leibniz Institute for Solid State and Materials Research Dresden (Author)
  • Xiang Zhang - , Zhengzhou University (Author)
  • Ran He - , Leibniz Institute for Solid State and Materials Research Dresden (Author)
  • Martin Hantusch - , Leibniz Institute for Solid State and Materials Research Dresden (Author)
  • Sebastian Lehmann - , Leibniz Institute for Solid State and Materials Research Dresden (Author)
  • Kornelius Nielsch - , Chair of Metallic Materials and Metal Physics, Leibniz Institute for Solid State and Materials Research Dresden, TUD Dresden University of Technology (Author)

Abstract

Surface modification may significantly improve the performance of thermoelectric materials by suppressing thermal conductivity. Using the powder atomic layer deposition method, the newly developed Sb2O5 thin films produced from SbCl5 and H2O2 were formed on the surfaces of Bi powders. Because of the high thermal resistance generated by Sb2O5 layers on Bi particles, a substantial decrease in κtot from 7.8 to 5.7 W m-1 K-1 was obtained with just 5 cycles of Sb2O5 layer deposition and a 16% reduction in κlat. Because of the strong phonon scattering, the maximum zT values increased by around 12% and were relocated to 423 K.

Details

Original languageEnglish
Pages (from-to)4041-4046
Number of pages6
JournalACS applied energy materials
Volume5
Issue number4
Publication statusPublished - 25 Apr 2022
Peer-reviewedYes

Keywords

Keywords

  • antimony oxide, bismuth, powder atomic layer deposition, thermal conductivity, thermoelectric