Strontium ferromolybdate Sr2FeMoO6 (SFMO) is a promising material for spintronic, photonic and plasmonic devices operating at room temperatures due to its high spin polarisation and high Curie temperature. Variations in SFMO lattice and material composition greatly impact magnetic properties and application range of spintronic devices. A high-quality SFMO film is difficult to obtain due to unavoidable defects and nonstoichiometry. Using multitarget reactive magnetron sputtering technology it is possible to achieve high density and precise composition of deposited films. The aim of this work is to reach an optimum SFMO film composition for the further development of multilayered magnetic film structures for spintronic devices. Films were deposited using an industrial sputtering system on 150 mm diameter platinized silicon wafers using high-purity Sr, Fe and Mo targets. For precise control of partial oxygen pressure, a plasma emission monitor (PEM) was used. Deposition parameters were adjusted and fine-tuned according to the evaluation of deposited SFMO films. The latter ones were investigated using Scanning Electron Microscope (SEM), Energy Dispersive X-Ray Spectroscopy (EDX), X-ray Diffraction (XRD), Atomic Force Microscope (AFM) and optical reflectance in the UV-IR range. The achieved SFMO film composition was close to the optimal one and samples were provided for further multilayered structure deposition to prototype and develop a spintronic sensor.