Photolabile carboxylic acid protected terpolymers for surface patterning. Part 1: Polymer synthesis and film characterization

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • M. Millaruelo - (Author)
  • K. -J. Eichhorn - (Author)
  • B. Sieczkowska - (Author)
  • B. Voit - , Leibniz Institute of Polymer Research Dresden (Author)

Abstract

We present the synthesis and characterization of a series of photolabile phenacyl derivative polymers and their subsequent thin film preparation. These systems are composed of up to three methacrylate units: a photolabile component including a p-methoxyphenacyl moiety which after selective irradiation (UV/laser) can provide free carboxylic groups in specific areas for further modification; an anchoring unit, trimethoxysiloxane or glycidyl methacrylate derivative, which allows the covalent attachment of the polymer to the substrate; and a spacer, methyl methacrylate or styrene, which in the appropriate proportion ensures the formation of films with good quality. Structural and thermal properties of these materials have been analyzed by means of NMR, FTIR, elemental analysis, UV, gel permeation chromatography, differental scanning calorimetry, and thermogravimetric analysis. The polymers have been subsequently processed by spin coating to render ultrathin films (< 50 nm). Topographic and structural characterization studies of the films have been carried out with atomic force microscopy, contact angle measurements, and X-ray photoelectron spectroscopy. The extent of the substrate attachment of the polymers depending on the nature of the anchoring groups have been studied by ellipsometry and FTIR.

Details

Original languageEnglish
Pages (from-to)9436-9445
Number of pages10
JournalLangmuir
Volume22
Issue number22
Publication statusPublished - 24 Oct 2006
Peer-reviewedYes
Externally publishedYes

External IDs

PubMed 17042566
Scopus 33751432170
ORCID /0000-0002-4531-691X/work/148607733

Keywords

Keywords

  • Self-assembled monolayers, Photochemical properties, Functionalized surfaces, Soft lithography, Phenacyl ester, Layers, Microstructures, Nanofabrication, Methacrylate, Copolymers