Method for Separating Wafers from Donor Substrates
Research output: Intellectual property › Patent application/Patent
Contributors
- Siltectra GmbH
Abstract
A method for separating wafers from donor substrates incudes: determining at least one individual property of a respective donor substrate, the at least one individual property including doping and/or crystal lattice dislocations of the respective donor substrate; generating donor substrate process data for the respective donor substrate, the donor substrate process data including analysis data of the analysis device, the analysis data describing the at least one individual property of the respective donor substrate; generating, via a laser device, modifications inside the respective donor substrate to form a separating region inside the respective donor substrate, the laser device being operable as a function of the donor substrate process data of the respective donor substrate; and generating mechanical stresses inside the respective donor substrate to initiate and/or guide a crack for separating at least one wafer from the respective donor substrate.
Details
A method for separating wafers from donor substrates incudes: determining at least one individual property of a respective donor substrate, the at least one individual property including doping and/or crystal lattice dislocations of the respective donor substrate; generating donor substrate process data for the respective donor substrate, the donor substrate process data including analysis data of the analysis device, the analysis data describing the at least one individual property of the respective donor substrate; generating, via a laser device, modifications inside the respective donor substrate to form a separating region inside the respective donor substrate, the laser device being operable as a function of the donor substrate process data of the respective donor substrate; and generating mechanical stresses inside the respective donor substrate to initiate and/or guide a crack for separating at least one wafer from the respective donor substrate.
| Original language | English |
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| IPC (International Patent Classification) | B28D 5/ 00 A I |
| Patent number | US2023390961 |
| Filing date | 23 Aug 2023 |
| Country/Territory | United States of America |
| Priority date | 23 Aug 2023 |
| Priority number | US202318454474 |
| Publication status | Published - 7 Dec 2023 |
| Externally published | Yes |
External IDs
| ORCID | /0000-0003-2572-1149/work/208796496 |
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