Method for Separating Wafers from Donor Substrates

Research output: Intellectual property › Patent application/Patent

Contributors

  • Marko David Swoboda - , Infineon Technologies AG (Inventor)
  • Christian Beyer - (Inventor)
  • Ralf Rieske - , Infineon Technologies AG (Inventor)
  • Albrecht Ullrich - (Inventor)
  • Jan Richter - (Inventor)
  • Siltectra GmbH

Abstract

A method for separating wafers from donor substrates incudes: determining at least one individual property of a respective donor substrate, the at least one individual property including doping and/or crystal lattice dislocations of the respective donor substrate; generating donor substrate process data for the respective donor substrate, the donor substrate process data including analysis data of the analysis device, the analysis data describing the at least one individual property of the respective donor substrate; generating, via a laser device, modifications inside the respective donor substrate to form a separating region inside the respective donor substrate, the laser device being operable as a function of the donor substrate process data of the respective donor substrate; and generating mechanical stresses inside the respective donor substrate to initiate and/or guide a crack for separating at least one wafer from the respective donor substrate.

Details

A method for separating wafers from donor substrates incudes: determining at least one individual property of a respective donor substrate, the at least one individual property including doping and/or crystal lattice dislocations of the respective donor substrate; generating donor substrate process data for the respective donor substrate, the donor substrate process data including analysis data of the analysis device, the analysis data describing the at least one individual property of the respective donor substrate; generating, via a laser device, modifications inside the respective donor substrate to form a separating region inside the respective donor substrate, the laser device being operable as a function of the donor substrate process data of the respective donor substrate; and generating mechanical stresses inside the respective donor substrate to initiate and/or guide a crack for separating at least one wafer from the respective donor substrate.

Original languageEnglish
IPC (International Patent Classification)B28D 5/ 00 A I
Patent numberUS2023390961
Filing date23 Aug 2023
Country/TerritoryUnited States of America
Priority date23 Aug 2023
Priority numberUS202318454474
Publication statusPublished - 7 Dec 2023
Externally publishedYes
No renderer: customAssociatesEventsRenderPortal,dk.atira.pure.api.shared.model.researchoutput.Patent

External IDs

ORCID /0000-0003-2572-1149/work/208796496