Method for producing an organic transistor and organic transistor
Research output: Intellectual property › Patent application/Patent
Contributors
- Novaled GmbH
Abstract
The invention refers to a method for producing an organic transistor, the method comprising steps of providing a first electrode (2) on a substrate (1), generating a source-drain insulator (3) assigned at least partially to the substrate (1) and/or at least partially to the first electrode (2), generating a second electrode (4) assigned to the source-drain insulator (3), depositing an organic semiconducting layer (5) on the first electrode (2), the second electrode (4), and the source-drain insulator (3), generating a gate insulator (6) assigned to the organic semiconducting layer (5), and providing a gate electrode (7) assigned to the gate insulator (6). Further, the invention relates to an organic transistor.
Details
The invention refers to a method for producing an organic transistor, the method comprising steps of providing a first electrode (2) on a substrate (1), generating a source-drain insulator (3) assigned at least partially to the substrate (1) and/or at least partially to the first electrode (2), generating a second electrode (4) assigned to the source-drain insulator (3), depositing an organic semiconducting layer (5) on the first electrode (2), the second electrode (4), and the source-drain insulator (3), generating a gate insulator (6) assigned to the organic semiconducting layer (5), and providing a gate electrode (7) assigned to the gate insulator (6). Further, the invention relates to an organic transistor.
Original language | English |
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IPC (International Patent Classification) | H01L 51/ 05 A I |
Patent number | WO2015144865 |
Country/Territory | Germany |
Priority date | 28 Mar 2014 |
Priority number | EP20140162388 |
Publication status | Published - 1 Oct 2015 |
External IDs
ORCID | /0000-0002-9773-6676/work/142659849 |
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