Method for producing an organic transistor and organic transistor

Research output: Intellectual Property › Patent application/Patent

Contributors

  • Novaled GmbH

Abstract

The invention refers to a method for producing an organic transistor, the method comprising steps of providing a first electrode (2) on a substrate (1), generating a source-drain insulator (3) assigned at least partially to the substrate (1) and/or at least partially to the first electrode (2), generating a second electrode (4) assigned to the source-drain insulator (3), depositing an organic semiconducting layer (5) on the first electrode (2), the second electrode (4), and the source-drain insulator (3), generating a gate insulator (6) assigned to the organic semiconducting layer (5), and providing a gate electrode (7) assigned to the gate insulator (6). Further, the invention relates to an organic transistor.

Details

The invention refers to a method for producing an organic transistor, the method comprising steps of providing a first electrode (2) on a substrate (1), generating a source-drain insulator (3) assigned at least partially to the substrate (1) and/or at least partially to the first electrode (2), generating a second electrode (4) assigned to the source-drain insulator (3), depositing an organic semiconducting layer (5) on the first electrode (2), the second electrode (4), and the source-drain insulator (3), generating a gate insulator (6) assigned to the organic semiconducting layer (5), and providing a gate electrode (7) assigned to the gate insulator (6). Further, the invention relates to an organic transistor.

Original languageEnglish
IPC (International Patent Classification)H01L 51/ 05 A I
Patent numberWO2015144865
Country/TerritoryGermany
Priority date28 Mar 2014
Priority numberEP20140162388
Publication statusPublished - 1 Oct 2015
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External IDs

ORCID /0000-0002-9773-6676/work/142659849