Highly transparent aluminum silicon oxy nitride permeation barriers for optoelectronic devices
Research output: Contribution to journal › Research article › Contributed › peer-review
Contributors
Abstract
We investigate the properties of sputtered aluminum silicon oxynitride layers for application as transparent permeation barrier front sheets for flexible opto-electronic applications. We compare the results from mixed aluminum-silicon and pure silicon targets when the reactive gas content is varied in a dynamic roll-to-roll process on the optical, structural, permeation properties of the layers. We observe that permeation barrier layers deposited from mixed aluminum-silicon targets shows a change in layer growth and the resulting properties compared with layers from a pure silicon Target.
Details
| Original language | English |
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| Article number | 132411 |
| Journal | Surface and Coatings Technology |
| Volume | 512 |
| Publication status | Published - 15 Sept 2025 |
| Peer-reviewed | Yes |
External IDs
| ORCID | /0000-0002-6269-0540/work/223382270 |
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Keywords
ASJC Scopus subject areas
Keywords
- Flexible electronics, Magnetron sputtering, Permeation barrier