Cross-linked polymer gate dielectric films for low-voltage organic transistors

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Mark E. Roberts - , Stanford University (Author)
  • Núria Queraltó - , Stanford University, Max Planck Institute for Polymer Research (Author)
  • Stefan C.B. Mannsfeld - , Stanford University, SLAC National Accelerator Laboratory (Author)
  • Benjamin N. Reinecke - , Stanford University (Author)
  • Wolfgang Knoll - , Max Planck Institute for Polymer Research (Author)
  • Zhenan Bao - , Stanford University (Author)

Abstract

Cross-linked polymer films were investigated as new gate dielectric materials for low-voltage thin-film transistors. Poly(4-vinylphenol) (PVP) was cross-linked through esterification reactions with commercially available bifunctional anhydrides, acyl chlorides, and carboxylic acids. The polymer dielectric films were evaluated based on surface morphology, capacitance, leakage current, and their compatibility with organic semiconductors. Thin insulating PVP films cross-linked with dianhydrides yielded a capacitance as high as 400 nF/cm 2 with leakage currents below 10 -8 A/cm 2. Organic thin-film transistors (OTFTs) fabricated on these gate dielectric layers exhibited charge carrier mobilities as high as 3 cm 2 (V s) for p-channel pentacene on octadecyltriethoxylsilane (OTS)-modified PVP and 0.045 cm 2/(V s) for n-channel perfluorinated copper phthalocyanine (FCuPc).

Details

Original languageEnglish
Pages (from-to)2292-2299
Number of pages8
JournalChemistry of materials
Volume21
Issue number11
Publication statusPublished - 9 Jun 2009
Peer-reviewedYes
Externally publishedYes