Computational analysis of the orientation persistence length of the polymer chain orientation

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

  • Falk Niefind - , Leibniz Institute of Surface Engineering (Author)
  • Andreas Neff - , Leibniz Institute of Surface Engineering (Author)
  • Stefan C.B. Mannsfeld - , Chair of Organic Devices (cfaed) (Author)
  • Axel Kahnt - , Leibniz Institute of Surface Engineering (Author)
  • Bernd Abel - , Leibniz Institute of Surface Engineering (Author)

Abstract

Analyzing and interpreting the nanoscale morphology of semiconducting polymers is one of the key challenges for advancing in organic electronics. The orientation persistence length (OPL) as a tool to analyze orientation maps generated by photoemission electron microscopy (PEEM)-a state of the art tool for nanoscale imaging/spectroscopy-is presented here. The OPL is a way to quantify the chain orientation within the polymer film in a single graph. In this regard, it is a convincing method that will enable additional direct correlations between the chain orientation and electrical or optical parameters. In this report, we provide computational insights into the factors that contribute to the OPL.

Details

Original languageEnglish
Pages (from-to)21464-21472
Number of pages9
JournalPhysical Chemistry Chemical Physics
Volume21
Issue number38
Publication statusPublished - 2019
Peer-reviewedYes

External IDs

PubMed 31535122