Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes

Research output: Contribution to journalResearch articleContributedpeer-review

Contributors

Abstract

In this study, a scatterometry-based monitoring system designed for tracking the quality and reproducibility of laser-textured surfaces in industrial environments was validated in off-line and real-time modes. To this end, a stainless steel plate was structured by direct laser interference patterning (DLIP) following a set of conditions with artificial patterning errors. Namely, fluctuations of the DLIP process parameters such as laser fluence, spatial period, and focus position are introduced, and also, two patterning strategies are implemented, whereby pulses are deliberately not fired at both deterministic and random positions. The detection limits of the system were determined by recording the intensities of the zero, first, and second diffraction order using a charge-coupled device (CCD) camera. As supported by topographical measurements, the system can accurately calculate spatial periods with a resolution of at least 100 nm. In addition, focus shifts of 70 µm from the optimum focus position can be detected, and missing patterned lines with a minimum width of 28 µm can be identified. The validation of this compact characterization unit represents a step forward for its implementation as an in-line monitoring tool for industrial laser-based micropatterning.

Details

Original languageEnglish
Pages (from-to)198-213
Number of pages16
JournalOptics
Volume4
Issue number1
Publication statusPublished - Mar 2023
Peer-reviewedYes

External IDs

Scopus 85164070546

Keywords

Keywords

  • Diffraction gratings, Direct laser interference patterning, In-line monitoring, Laser texturing, Microfabrication, Scatterometry