The emerging technology of two-photon polymerization (TPP) lithography may be employed in the construction of acoustic metamaterials. The literature does not yet report the acoustic material parameters that are needed for the design. Accordingly, the elastic and acoustic material properties of the photoresist IP-Q were investigated through the use of scanning acoustic microscopy (SAM) and nanoindentation (NI). The specific acoustic impedance was determined to be approximately 3.5 MRayl. Modifications to the process parameters allow for precise adjustments to the acoustic characteristics. The suitability of the method for the creation of metamaterials was investigated using two-phase samples.